I-High Temperature Vacuum Izingxenye
Ukwelashwa kokushisa ikakhulukazi kuhlanganisa i-oxidation, ukusabalalisa kanye nezinqubo zokudonsa.I-oxidation inqubo yokwengeza lapho ama-wafer e-silicon afakwa esithandweni sokushisa okuphezulu futhi kufakwa umoya-mpilo ukuze kusabelane nawo ukuze kwakheke i-silica ebusweni be-wafer.I-Diffusion iwukuhambisa izinto zisuka endaweni yokuhlushwa ephezulu ziye endaweni yokuhlushwa ephansi ngokusebenzisa ukunyakaza kwe-molecular thermal, futhi inqubo yokusabalalisa ingasetshenziswa ukudopha izinto ezithile ze-doping ku-substrate ye-silicon, ngaleyo ndlela kuguqule ukusebenza kwama-semiconductors.